半导体生产过程培训课件(ppt 48页)
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资料简介：
EE 4345 - Semiconductor Electronics Design Project
HISTORY
Semiconductor Manufacturing Process
Semiconductor Manufacturing Process (cont)
Silicon Manufacturing
FABRICATING SILICON
CRYSTAL GROWTH
CYLINDER OF MONOCRYSTALLINE
WAFER MANUFACTURING
THE CRYSTAL STRUCTURE OF SILICON
Photolithography
主要内容
Photolithography Photoresist
Photolithography Photoresist
PhotolithographyModel
PhotolithographyModel (cont)
PhotolithographyPhotomasks and Reticles
PhotolithographyPatterning
The simplest method of producing an oxide layer consists of heating a silicon wafer in an oxidizing atmosphere.
Deposited Oxides
Key Variables in Oxidation
Etching
Wet Chemical Etching
Example Wet Processes
What is a plasma (glow discharge)?
Dry or Plasma Etching
Other Effects of Oxide Growth and Removal
Local Oxidation of Silicon (LOCOS)
WN-Junction Fabrication (Earliest method)
The Planar Process
Methods of planar process
Diffusion Process Ion Implantation
Comparison of Diffusion and Ion Implantation
References
Bibliography
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