WET工艺介绍(PPT 63页)
所属分类:工艺技术
文件大小:7148 KB
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点击下载For Etching process
Oxide remove.
Nitride remove.
Photoresist & polymer remove.
For Cleaning process
Free of particles.
Free of metal ion.
Free of organic.
Free of micro-roughness.
Free of native oxide.
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